Project: Computer-Aided Nano-Manufacturing

The objective of this research is to develop new modeling and simulation mechanisms that allow us to understand the fundamentals of physical and chemical processes at the atomistic scale in order to realize scalable nanomanufacturing.

Atomic force microscope lithography Focused ion beam lithography Ionized physical vapor deposition Nanoimprint lithography

Controllable Kinetic Monte Carlo Simulation

Kinetic Monte Carlo (KMC) is regarded as an efficient tool for rare event simulations such as reaction and phase transition. It has been used to simulate the bottom-up self-assembly processes. Yet, it cannot simulate top-down processes with controlled energy injections and paths. In this research, a new and generalized KMC mechanism, called controlled KMC or cKMC, is developed to simulate the complete physical and chemical processes in both top-down and bottom-up nanomanufacturing processes, such as nanolithography, nanoimprint lithography, physical vapor deposition, and chemical vapor deposition.

cKMC has also been applied to simulate other additive manufacturing processes such as coating and direct energy deposition.